Oxidative scrubber


  • Removal of volatile sulphur compounds:

    • H2S

    • dimethyl sulphide CH3SCH3

    • dimethyl disulphide CH3S2CH3

    • ...

  • Removal of formaldehyde CH2O

  • Removal of nitrogen oxides NOx

  • ...


Oxidative gas scrubbing usually implies a transfer of volatile components from the gas phase to the liquid phase (water) with a subsequent chemical oxidation of the dissolved compounds. This oxidation is most often realised using sodium hypochlorite (NaOCl) or hydrogen peroxide (H2O2) as an oxidant.

When ozone (O3) is used as an oxidant, the actual oxidation usually takes place in the gas phase before the scrubber while the (partially) oxidised compounds are retained in the scrubber.

Sodium hypochlorite (NaOCl) is most often used as an oxidant in oxidative scrubbers because of its high oxidising capacity and its easy availability. Oxidative scrubbing implicates an automated control of both the redox (ORP) and the pH value of the scrubbing water. Control of the pH is crucial in order to optimise kinetics, minimise chemical consumption, prevent chemical depositions and minimise the emission of unwanted compounds. Next to that, a refreshment of scrubbing liquid based on the electrical conductivity (EC) is needed. 

In order to prevent the formation of toxic chloramines in the oxidative scrubber, NH3 and amines should  be removed from the waste gas in an upstream acid scrubber.

Under optimal conditions, very high (> 99%) removal efficiencies can be obtained in an oxidative scrubber for compounds as e.g. H2S and CH₃SCH₃.



Oxidative scrubber (NaOCl) for removal of dimethyl sulfide

Oxidative scrubber (NaOCl) for removal of H2S and organic sulphur components